Chapter 1

General Information

Introduction

NX-Interferom is a leading-edge, multi-scale metrology system that integrates Atomic Force Microscopy (AFM), Atomic Force Profiler (AFP), and White Light Interferometry (WLI) on a single platform. WLI provides high-throughput, large-area imaging, while AFM and AFP deliver sub-nanometer precision for detailed surface characterization. The combined use of WLI and AFM for cross-validated surface profile metrology has been demonstrated in subwavelength grating characterization, where the two modalities complement one another in spatial scale and accuracy^[1]. This configuration ensures precise optical control and allows smooth image stitching with minimal overlap.

NX-Interferom inherits the foundation of NX-Hybrid WLI and redefines interferometry through Park Systems' proprietary system design. The term “Interferom” combines interferometry with Park's integrated platform concept, representing a unique approach that extends beyond conventional optical metrology.

Park's proven AFM technology directly enhances WLI performance by using the AFM Z-scanner for optical height scanning. This enables precise optical control and produces smooth image stitching with minimal overlap between neighboring images. A motorized dual-objective turret further adds versatility, allowing users to switch easily between wide field-of-view imaging and high-resolution imaging.

NX-Interferom delivers reliable sub-nanometer precision through Park AFM's proprietary technologies, including minimized out-of-plane motion via a decoupled XY scan system, precise orthogonality and positioning with independent dual-servo XY control, fast vertical response enabled by a high-resonance-frequency Z scanner, and extended tip life through True Non-Contact™ scanning.

The NX-Interferom platform offers a single, integrated workflow across three metrology modes. WLI supports rapid, large-area inspection; AFP provides monochromatic illumination for faster, more precise measurements but with a smaller height range; and AFM enables direct, sub-nanometer imaging of fine surface features. A motorized dual-objective turret allows seamless transitions between modes within both observation and measurement workflows. Prior work on complementary characterization techniques has shown that combining methods with different sensing geometries provides richer, more reliable information than any single modality alone^[2].

NX-Interferom is designed to meet SEMI standards for seamless integration into semiconductor fabs, enabling end-to-end automation from wafer loading to measurement, analysis, and unloading. The system has been adopted by major semiconductor manufacturers worldwide.